The electronic structures of the 8-hydroxyquinoline-aluminum (Alq(3))/Al2O3/Co interfaces were studied by photoelectron spectroscopy. A strong interface dipole was observed, which leads to a reduction in the electron injection barrier. The x-ray photoelectron spectroscopy spectra further indicate that the Al2O3 buffer layer prevents the chemical interaction between Alq(3) molecules and Co atoms. X-ray magnetic circular dichroism results demonstrate that a Co layer deposited on an Al2O3 buffered Alq(3) layer shows better magnetic ordering in the interface region than directly deposited Co, which suggests a better performance of spin valves with such a buffer layer. This is consistent with the recent results from [Dediu , Phys. Rev. B 78, 115203 (2008)].
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机译:通过光电子能谱研究了8-羟基喹啉-铝(Alq(3))/ Al2O3 / Co界面的电子结构。观察到强界面偶极子,这导致电子注入势垒减小。 X射线光电子能谱还表明Al2O3缓冲层阻止了Alq(3)分子和Co原子之间的化学相互作用。 X射线磁性圆二色性结果表明,与直接沉积的Co相比,沉积在Al2O3缓冲的Alq(3)层上的Co层在界面区域表现出更好的磁有序性,这表明自旋阀具有这种缓冲层的性能更好。这与[Dediu,Phys。 B 78,115203(2008)。
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